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Photomask Blanks (EUV)

High dependencyBuild-nowSemiconductorsReasoned estimateHS 9013.20
$0.03 bnAnnual import
2%Indian capability
5,436Supplier concentration (HHI)
₹1,030 crTo localise

Why India imports it. Reasoned estimate: India has limited domestic capacity for photomask blanks (euv); sector trade patterns indicate continued import reliance.

Why it matters. Strategic dependency within semiconductors value chain; affects downstream manufacturing competitiveness.

Can India localise it? Hard

Where it comes from. Japan (66%), Taiwan (18%), China (16%).

Scorecard

The ten indices

CMDI 67.7Dependency
LPI 38.25Localisation potential
IAI 57.75Investment attractiveness
SRI 75.43Supply risk
SCI 60.25Supply-chain complexity
TRI 39.25Technology readiness
IMI 73.5Industrial multiplier
NSRI 61.75National-security relevance
EPI 57Export potential
ICGI 83.98Capability gap
Intelligence

Related signals

Sources

Primary references

Confidence: Reasoned estimate. Reasoned estimate derived from sector trade patterns and HS code classification; specific company/number values are modelled. Part of Techadyant Labs' Critical Manufacturing Dependencies (Edition I).