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Photomask Blanks (EUV)

Critical dependencyBuild-nowSemiconductorsReasoned estimateHS 9013.20
$0.07 bnAnnual import
6%Indian capability
5,166Supplier concentration (HHI)
₹1,234 crTo localise

Why India imports it. Reasoned estimate: India has limited domestic capacity for photomask blanks (euv); sector trade patterns indicate continued import reliance.

Why it matters. Strategic dependency within semiconductors value chain; affects downstream manufacturing competitiveness.

Can India localise it? Hard

Where it comes from. Japan (63%), Taiwan (21%), China (16%).

Scorecard

The ten indices

CMDI 75.49Dependency
LPI 38.25Localisation potential
IAI 57.75Investment attractiveness
SRI 73.73Supply risk
SCI 60.25Supply-chain complexity
TRI 39.25Technology readiness
IMI 73.5Industrial multiplier
NSRI 61.75National-security relevance
EPI 57Export potential
ICGI 83.03Capability gap
Intelligence

Related signals

Sources

Primary references

Confidence: Reasoned estimate. Reasoned estimate derived from sector trade patterns and HS code classification; specific company/number values are modelled. Part of Techadyant Labs' Critical Manufacturing Dependencies (Edition I).